Die Characteristics
DIE DIMENSIONS:
83.9 mils x 159 mils
METALLIZATION:
Type: CuAl
Thickness: 16kÅ ±2kÅ
SUBSTRATE POTENTIAL (NOTE):
-VSUPPLY
HI-546, HI-547, HI-548, HI-549
PASSIVATION:
Type: Nitride Over Silox
Nitride Thickness: 3.5kÅ ±1kÅ
Silox Thickness: 12kÅ ±2kÅ
WORST CASE CURRENT DENSITY:
1.4 x 105 A/cm2
TRANSISTOR COUNT:
485
PROCESS:
CMOS-DI
NOTE: The substrate appears resistive to the -VSUPPLY terminal, therefore it may be left floating (Insulating Die Mount) or it may be mounted on a
conductor at -VSUPPLY potential.
Metallization Mask Layouts
HI-546
EN
A0
A1 A2
A3 VREF
(18)
(17)
(16) (15) (14) (13)
GND
(12)
HI-547
EN
A0
A1 A2
NC VREF
(18)
(17)
(16) (15) (14) (13)
GND
(12)
IN 1
(19)
IN 2
(20)
IN 3
(21)
IN 4
(22)
IN 5
(23)
IN 6
(24)
IN 7
(25)
IN 8
(26)
V- (27)
OUT (28)
+V (1)
IN 9
(11)
IN 10
(10)
IN 11
(9)
IN 12
(8)
IN 13
(7)
IN 14
(6)
IN 15
(5)
IN 16
(4)
NC (2)
IN 1A
(19)
IN 2A
(20)
IN 3A
(21)
IN 4A
(22)
IN 5A
(23)
IN 6A
(24)
IN 7A
(25)
IN 8A
(26)
V- (27)
OUT A (28)
+V (1)
IN 1B
(11)
IN 2B
(10)
IN 3B
(9)
IN 4B
(8)
IN 5B
(7)
IN 6B
(6)
IN 7B
(5)
IN 8B
(4)
OUT B(2)
14